Monday, December 03, 2012

Ultrapure Water System Starting Up at Nanotechnology Center in Philadelphia

Res-Kem supplied, to a new nanotechnology center in Philadelphia, an ultrapure water system. The start up will commence this Monday. The system is designed to produce water with three different qualities to supply:
  • 10 gpm to process cooling equipment
  • 40 gpm to laboratory benches and humidification equipment
  • 75 to 125 gpm to recirculation loop feeding process tools
Ultrapure Water System Produces a Maximum of 125 gpm of UPW
Ultrapure Water Loop Specifications
Parameter
Specification
Measurement Location
Instrument or Analysis Method
Resistivity
(% of time)
< 18.2 M-ohm-cm
(100%)
On-line
Thornton 770 MAX
TOC
< 2 ppb
On-line
Sievers 500RLE
Dissolved Oxygen
< 5 ppb average
10 ppb maximum
On-line
Swan Oxytrace
Particles
< 80 particles/liter >=0.05 micron
On-line
PMS Ultra D150
Bacteria
< 1 CFU/liter
Off-line
Low nutrient agar
Al, Ca, Co, Cr, Cu, Fe, K, Mg, Na, Ni, Pb, Zn
< 5 ppt
Off-line
IC
Boron
0.1 ppb maximum
On-line
Sievers
Dissolved Si as SiO2
< 50 ppt
On-line
Swan

The system is designed to allow for easy expansion to double the makeup rate to the ultrapure water recirculation loop.

For more Information:
Contact us if you would like presentation about this project
Modular Ultrapure Water Systems
On-line Industrial Water Treatment Catalog